ICP-OES

XRD

X-ray crystallography is a method based on the diffraction of X-ray beams in various directions specific to the crystal structure. It allows for the analysis of powders, thin films, and bulk materials. The X-ray diffraction analysis method is non-destructive and enables the characterization of even very small amounts of samples. With the XRD instrument, phase analysis (search-match) and Rietveld analysis (structural refinement) can be performed alongside diffraction profiles. XRD measurements provide critical data regarding the phases present in a material, their relative proportions, crystallite size, lattice parameters, structural variations, crystal orientation, and atomic positions.

Technical Specifications

  • X-Ray Source: Cu-Kα with Ni filter
  • Source Voltage: 10–60 Kv
  • Source Current: 5–60 mA
  • Maximum Output Power: 3 kW
  • Normal Scan Speed: 0.1° (2θ/s)
  • Scanning Range: -111° < 2θ < 168°

Primary Application Areas

  • Structural analysis of synthesized materials
  • Analysis of metals and alloys
  • Identification of minerals and rocks in geology
  • Detection of polymorphs and impurities in materials
  • Diffraction imaging for textile fibers and fabrics
  • Analysis of polymers
  • Composition determination of thin films
  • Identification of materials forming historical structures in archaeology